Effects of multiple buffer layers on structural electronic properties of GaN growth by atmospheric pressure Organometallic Vapor Phase Epitaxy

NCU Institutional Repository > 研究中心 > 光電科學研究中心 > 期刊論文 > Item 987654321/29721

請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/29721

題名:	Effects of multiple buffer layers on structural electronic properties of GaN growth by atmospheric pressure Organometallic Vapor Phase Epitaxy
作者:	Yang,CC;Wu,MC;Chang,CA;Chi,GC
貢獻者:	光電科學研究中心
關鍵詞:	FIELD-EFFECT TRANSISTOR;LASER-DIODES;SUBSTRATE
日期:	1999
上傳時間:	2010-06-30 15:39:31 (UTC+8)
出版者:	中央大學
摘要:	High-quality GaN epitaxial films have been grown on sapphire by organometallic vapor phase epitaxy using multiple-pair buffer layers. Each pair of buffer layers consists of a thin GaN nucleation layer grown at a low temperature around 500 degrees C and a thick GaN epitaxial layer around 4 mu m thick grown at a high temperature around 1000 degrees C. The sample with four-pair buffer layers showed much improved GaN epitaxial films, as compared to the sample with only one-pair of buffer layers. The better qualities include narrower full width at half maximum of 150 arc-s and stronger intensity in double-crystal X-ray diffraction, higher electron mobility of 420 cm(2) V-s(-1), lower background concentration of 3 x 10(17) cm(-3), and lower etch-pit density of mid-10(5) cm(-2). (C) 1999 Elsevier Science S.A. All rights reserved.
關聯:	MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
顯示於類別:	[光電科學研究中心] 期刊論文

文件中的檔案:

檔案	描述	大小	格式	瀏覽次數
index.html		0Kb	HTML	775	檢視/開啟

在NCUIR中所有的資料項目都受到原著作權保護.

社群 sharing